In order to study the effects of the crystal size and compactness of copper film on the drive ability of flyer with the exploding foil, X-ray diffraction was applied to analyze the structure of copper film deposited by e-beam evaporated deposition and magnetron sputtering. The exploding bridge foil was fabricated with photolithography. The velocity of the flyer under different voltage was investigated by physical vapor deposition to study the ability of flyer driven by exploding bridge film. The up-and-down method was implemented to analyze the threshold exploding energy of hexanitrostilbene-Ⅳ, which was successfully initiated by flyer. It is found that the copper film deposited by magnetron sputtering has smaller crystal, and is more than 17% higher resistivity, and 2.4 times faster deposition rate than that by e-beam evaporated deposition. It reveals that the capacity of flyer driven by copper film with magnetron sputtering is better than e-beam evaporated deposition, showing the lower threshold energy to initiate hexanitrostilbene-Ⅳ.