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Fabrication of Ni-Cr Film Igniting Resistor
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Shaanxi Applied Physics-Chemistry Research Institute.

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    Abstract:

    The sputtering and etching techniques of Ni-Cr film igniting resistor were studied in order to achieve even resistance and low firing voltage,at the same time,the parameter of igniting resistor was tested. The results show that the velocity of film sputter diminishes and the compact performance of film improves as sputtering power reduces. The resistance coherence of Ni-Cr film igniting resistor is good,and average firing voltage is 6.67 V when charge capacitance is 47 μF.

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解瑞珍,任小明,王可暄,等. Ni-Cr桥膜换能元的制备[J].含能材料,2011,19(5):584-587.
XIE Rui-zhen, REN Xiao-ming, WANG Ke-xuan, et al. Fabrication of Ni-Cr Film Igniting Resistor[J]. Chinese Journal of Energetic Materials,2011,19(5):584-587.

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History
  • Received:December 08,2010
  • Revised:June 21,2011
  • Adopted:May 12,2011
  • Online: February 22,2012
  • Published: