Page 174 - 《含能材料》火工品技术合集 2015~2019
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0
d=0.01, f y =lnx =0.691, :VOf, HÈOÐ9 Table5 FiringcurrentofsampleLandL08
0
0
ש, T080MNÚI\ x =2.020AÁÔm:? sample μ /A σ I 0.1% /A I 99.9% /A
0
L 1.043 0.0329 0.944 1.142
d=0.01 f y =lnx =0.703(T:VOf, efÌò
0
0
L08 1.028 0.0424 0.901 1.155
¾ò GJBZ377A-1994²4Of:ÌÏì×ÅÙ×
ÛF#©, TY T080 0.1%[*#HY 99.9%[
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Table4 FiringcurrentofsamplesD andT08 -[./0abkl, zÜGHIJKLM, NOPQ
R!"#$ST&'(*+,[*²4, gÐ~M:
sample μ /A σ I 0.1% /A I 99.9% /A
(1) C#DE#[*KLM,SCB*+,QR ZnO
T 1.994 0.01369 1.953 2.035
T08 2.004 0.01311 1.965 2.043 !"#$% TSCB*+,0#-.//3no12。
Note:μisthe50% firingcurrent.σ isthestandarddeviation.I 0.1% isthe (2) C # D E # [ * K L M, Q R
0.1% firingcurrent.I 99.9% isthe99.9% firingcurrent.
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$á12 LSCB*+,0-[]^Y-[/\;wQ
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R SFI0603ML080CLF!"#$0 © , L08, ³ - [
99.9%0[*#H? 2.035A, ©, T080 0.1%[
st/\: t ifÙifjk3no.ab, -[]
*#H? 1.965A、99.9%0[*#H? 2.043A; Ý ^mno.ab。
æ^õ(1±5)%, 9F©, T0Ýæ 0.1%[*# (3) CGHIJÙM, !"#$?¤D£;á'
H;<? 1.838~2.032A,99.9%[*#H;<? ÇOP, ÑD°/3#HÇÈ, % SCB*+,0#-.
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/m12, : t ifÙifjkQR!"#$% TSCB
0[*#H、99.9% 0[*#HlCÝæ^=, Q
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R!"#$T%; TSCB*+,0GH[*²4/3
12。¹?!"#$%GHÙ¤D, CGHM!" rs!@:
#$£;á'ÇOP, Ñ D ° / 3 #H Ç È, % SCB [1]t9>,?@A,BC.#0*+,89#<Û«¬M2¨cd
[J].D/ÿ!,2012,20(5):610-613.
*+ , 0 # - . / / 3 1 2, Q R ! " # $ % ;
WANG Kexuan,BAIYingwei,REN Wei,etal.Responserule
TSCB*+,0GH[*²4/312。 ofhotwireeedincontinuouselectromagneticenvironment[J].
ChineseJournalofEnergeticMaterials(HannengCailiao),2012,
3.2.2 kT%&'(m4 LSCB./0
20(5):610-613.
HÈ O Ð 9 × © , L、L080 M N Ú I \ x = [2]BaginskiTA,BaginskiM E.CharacterizationofaNovelPassive
0
RFFilterforFrequenciesof4225MHz[J].IEEETransactionson
1.100A ÁÔm:? d=0.035f y =lnx =0.0953
0 0 ElectromagneticCompatibility,1990,32(2):163-167.
(T:VOf, efÌò¾ò《GJBZ377A-1994² [3]HendersonJH,BaginskiTA.AnRFinsensitivehybridelectroex
plosivedeviceincorporatinganintegralfilter[J].IEEETransac
4O f : Ì Ï ì × Å Ù》 ° 0× Û F © , L、L080
tionsonIndustryApplications,1996,32(2):465-470.
0.1%[*#HY 99.9%[*#H, gh~j 5。 [4]NovotneyD B,WelchBM,EvickD W.Semiconductorbridge
developmentforenhancedESD andRFimmunity[R].AIAA99
j 59é, Ýæ^õ(1±5)%, ©, L 0Ýæ
2417:1999.
0.1%[*#H;<? 0.897~0.991A,99.9%[* [5]KingTL,TarbellW W.Pintopinelectrostaticdischargeprotec
tionforsemiconductorbridges[R].SAND20022213:2002.
#H;<? 1.085~1.20A, ©, L080 0.1%0[
[6]CHEN Fei,ZHOU Bin,QIN Zhichun,etal.Researchondam
*#H、99.9% 0[*#HlCÝæ^=, îQR agemechanism ofSCBinitiatorsunderRF[J].PrzegladElektro
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